Teledyne Scientific & Imaging has extensive capabilities in the fabrication of world-class electronic devices and nanostructures. These capabilities have been built on a foundation of successful R&D programs spanning decades. Our expertise in semiconductor fabrication has delivered record performance in speed, power-consumption, power delivery, and sensitivity in our devices and circuits. Going beyond electronic devices, our fabrication services are well suited for, and have been utilized in, the production of optical components and nanostructures using both semiconductor and non-semiconductor materials for a wide range of applications.

Our capabilities are comprehensive, ranging from CAD services to materials growth and fabrication. Using electron beam lithography, we are able to define patterns as small as 20 nm. With extensive resources and experience in photolithography, deposition, and etch processes, our e-beam lithography forms a complete suite of fabrication services meeting the most stringent technical requirements, and with rapid turn-around time.

Our specialty fabrication services include:

• CAD layout
• Epitaxial growth of arsenide and antimonide semiconductor materials by MBE
• E-beam lithography for T-gates, gratings, lenses, and deep submicron patterns on a variety of materials and substrate sizes
• I-line 5X stepper lithography
• Metal and dielectric depositions
• RIE and ICP etching of semiconductor and dielectric materials

For more information contact us at:
electronics@teledyne-si.com